Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques - Université Sorbonne Paris Nord Accéder directement au contenu
Communication Dans Un Congrès Année : 2014

Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques

Résumé

Microwave H2/CH4 and H2/CH4/B2H6 plasmas used for diamond deposition have been investigated by Infrared Tunable Diode Laser Absorption Spectroscopy (IR TDLAS) and Optical Emission Spectroscopy (OES) techniques in order to monitor six different molecular species CH4, C2H2, C2H4, C2H6, B2H6 and B.
Fichier non déposé

Dates et versions

hal-01056873 , version 1 (20-08-2014)

Identifiants

  • HAL Id : hal-01056873 , version 1

Citer

C. Rond, S. Hamann, M. Wartel, G. Lombardi, A. Gicquel, et al.. Chemical analysis of H2/CH4 and H2/CH4/B2H6 high pressure-high power microwave plasma using TDLAS and OES techniques. 6th International Workshop on Plasma Spectroscopy, Jun 2014, Hoboken, United States. ⟨hal-01056873⟩
66 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More